DocumentCode :
1033183
Title :
The presence of deep levels in ion implanted p-n junctions in GaAs and their effect on the electrical characteristics
Author :
Hunsperger, R.G. ; Marsh, O.J. ; Mead, C.A.
Volume :
15
Issue :
9
fYear :
1968
fDate :
9/1/1968 12:00:00 AM
Firstpage :
687
Lastpage :
687
Keywords :
Capacitance-voltage characteristics; Electric variables; Gallium arsenide; Ion implantation; Isolation technology; Laboratories; P-n junctions; Protons; Schottky diodes; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16442
Filename :
1475344
Link To Document :
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