DocumentCode :
1033518
Title :
Ferrite plating of Fe3O4 and Fe3-xNixO4 films at 100-200°C
Author :
Itoh, Takayuki ; Abe, Makoto ; Sasao, T. ; Tamaura, Y.
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol.
Volume :
25
Issue :
5
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
4230
Lastpage :
4232
Abstract :
Ferrite plating of Fe3-xNixO4 ( x=0-0.93) films in the temperature region T=120°C-200°C and in the pressure region P=15-20 kg/cm2 was performed. A reaction solution and an oxidizing solution were supplied to a reaction cell by high-pressure pumps. A phase diagram for an iron oxide film was obtained for T=120°C-180°C and pH=4.0-7.6. Single-phase Fe3 O4 (x=0) film grows only at T=180°C and pH=6.0-7.6, with the α-Fe2O3 phase appearing outside the region. The solubility limit of Ni increases as the plating temperature increases, from x=~0.3 at 80°C to x=0.93 at 200°C. All the films are polycrystalline with no preferential orientation, and the magnetization exhibits no definite anisotropy. The grain size of the films increases as x increases, reaching ~1 μm at x=0.86
Keywords :
electroless deposition; ferrimagnetic properties of substances; ferrites; magnetic thin films; 1 micron; 100 to 200 C; 15 to 20 kgf/cm2; Fe3-xNixO4; Fe3O4; ferrite plating; grain size; high-pressure pumps; magnetization; oxidizing solution; phase diagram; plating temperature; reaction cell; reaction solution; Conductivity; Data mining; Equations; Ferrite films; Frequency dependence; Iron; Magnetics; Mathematical model; Polynomials; Proposals;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.42578
Filename :
42578
Link To Document :
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