DocumentCode :
1033675
Title :
Broadband continuously variable microwave phase shifter employing a distributed Schottky contact on silicon
Author :
Hietala, Vincent M. ; Kwon, Y.R. ; Champlin, K.S.
Author_Institution :
University of Minnesota, Department of Electrical Engineering, Minneapolis, USA
Volume :
23
Issue :
13
fYear :
1987
Firstpage :
675
Lastpage :
677
Abstract :
Fabrication details and microwave measurements are presented for the first realisation of a silicon, broadband, voltage-controlled, microwave phase shifter comprising a coplanar, slow-wave, Schottky-contact transmission line. This structure exhibits very little dispersion over the measured frequency range of 1¿20 GHz. A voltage-dependent `wave compression¿ factor is observed that can be varied from 11.7 to 17.0 by varying the bias between ¿6 and +0.1 V. Even though the device is fabricated on a `true¿ (lossy) semiconducting substrate, the attenuation per unit length is smaller than that reported for a similar structure fabricated on semi-insulating GaAs.
Keywords :
elemental semiconductors; silicon; solid-state microwave devices; 1 to 20 GHz; SHF; Schottky-contact transmission line; Si substrate; UHF; attenuation per unit length; broadband phase shifter; continuously variable microwave phase shifter; dispersion; distributed Schottky contact; fabrication; microwave measurements; semiconducting substrate; slow-wave; voltage-controlled phase-shifter; wave compression;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19870482
Filename :
4257816
Link To Document :
بازگشت