DocumentCode :
1033777
Title :
A new insulated gate tetrode with high drain breakdown potential and low miller feedback capacitance
Author :
Dill, Hans G.
Author_Institution :
Hughes Research Laboratories, Newport Beach, Calif.
Volume :
15
Issue :
10
fYear :
1968
fDate :
10/1/1968 12:00:00 AM
Firstpage :
717
Lastpage :
728
Abstract :
Insulated gate field effect transistors (IGFET\´s) with the gate offset from the drain electrode exhibit high drain breakdown potential and very low Miller feedback capacitance. The new insulated gate tetrode (IGT) described in this paper utilizes a second stacked gate to create the offset channel. The main advantage is the possibility of optimizing the device performance, especially the drain breakdown potential for both P -and N -channel devices. Considered in the paper are design and fabrication problems, V-I characteristics, drain breakdown potential, dynamic drain resistance, small-signal equivalent circuit, and large-signal limitations. P -channel IGT\´s with drain breakdown potentials up to 300 V have been built. The design of the IGT depends mainly on the tradeoff between drain breakdown potential and the limited frequency response caused by the time constant of the offset channel. The results to date indicate that the IGT has a large drain voltage range and an extremely low Miller feedback capacitance and is adaptable to different operating conditions. The IGT appears very promising for use in power amplifiers and switching applications.
Keywords :
Capacitance; Electric breakdown; Electrodes; Equivalent circuits; FETs; Fabrication; Feedback; Frequency response; Insulation; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16504
Filename :
1475406
Link To Document :
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