• DocumentCode
    1033886
  • Title

    Magnetic flux reversal in laminated Ni-Fe films

  • Author

    Humphrey, F.B. ; Hasegawa, R. ; Clow, H.

  • Author_Institution
    California Institute of Technology, Pasadena, Calif.
  • Volume
    2
  • Issue
    3
  • fYear
    1966
  • fDate
    9/1/1966 12:00:00 AM
  • Firstpage
    557
  • Lastpage
    559
  • Abstract
    Anomalously fast flux reversal has been observed in films made of Ni-Fe layers separated by SiO. The speed of reversal increases as the number of identical layers of Ni-Fe increases. For a 5-layer film, the anomalous speed is observed in films with the SiO thickness as great as 1600 Å. Reversal time curves presented as a family of curves of 1/\\tau = f(h_{\\perp }) with hsas a parameter have two regions. The high-drive region has a lower slope in the laminated films when compared to the single-layer films. For this family of curves, a switching coefficient S_{w\´} can be defined, as the inverse slope, in a manner similar to the definition of Swfor 1/\\tau = f(h_{s}) with h_{\\perp } as a parameter. For films with from two to five layers, Sw\´ is constant at 1 \\times 10^{-3} \\mu s and is smaller by an order of magnitude for the single-layer films. A dual loop experiment is used to confirm that coherent rotation is not a dominant mechanism. It is concluded that a model must satisfy the following criteria to successfully describe flux reversal in the laminated films: It must provide rapid flux reversal for fields less than Hk, an insensitivity to transverse fields either constant or pulsed, and an interaction that can survive over a wide range of SiO thicknesses.
  • Keywords
    Iron-nickel films; Laminated magnetic materials; Magnetization reversal; Nickel-iron films; Anisotropic magnetoresistance; Coercive force; Glass; Laboratories; Magnetic films; Magnetic flux; Magnetic separation; Substrates; Thickness control; Thickness measurement;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1966.1065923
  • Filename
    1065923