• DocumentCode
    1034109
  • Title

    Preferred crystal orientation of sol-gel-derived B4-xLaxTi3O12thin films on silicon substrates takayuki tajiri, kazushi sumitani, rie haruki, and atsushi kohno

  • Author

    Tajiri, Takayuki ; Sumitani, Kazushi ; Haruki, Rie ; Kohno, Atsushi

  • Author_Institution
    Fukuoka Univ., Fukuoka
  • Volume
    54
  • Issue
    12
  • fYear
    2007
  • fDate
    12/1/2007 12:00:00 AM
  • Firstpage
    2574
  • Lastpage
    2578
  • Abstract
    Polycrystalline thin films of La-substituted bismuth titanate (BLT) were formed directly on p-type Si(100) substrates by using sol-gel and spin-coat methods. The BLT film and interfacial layer between BLT and Si were quantitatively investigated by the X-ray reflectivity method. Also, crystal orientations of sub-100-nm-thick BLT thin films were confirmed by X-ray diffraction using a synchrotron radiation source. The preferred c-axis orientation normal to the surface depended on the crystallization temperature. The difference in the preferred c-axis orientations of the BLT films caused the difference in the hysteresis voltage width in the capacitance-voltage characteristics of Au/BLT/p-Si structures. Furthermore, the c-axis of the Bi-layered structure was preferentially oriented and aligned in the in-plane direction.
  • Keywords
    MIS structures; X-ray diffraction; X-ray reflection; bismuth compounds; crystal orientation; crystallisation; dielectric hysteresis; elemental semiconductors; ferroelectric thin films; ferroelectric transitions; gold; lanthanum compounds; reflectivity; silicon; sol-gel processing; spin coating; texture; Au-Bi4-xLaxTi3O12-Si; La-substituted bismuth titanate thin films; Si; X-ray diffraction; X-ray reflectivity method; bismuth layer-structured ferroelectrics; capacitance-voltage characteristics; crystallization temperature; hysteresis voltage; interfacial layer; metal-ferroelectric-semiconductor structures; polycrystalline thin films; preferred crystal orientation; silicon substrates; sol-gel methods; spin-coat methods; synchrotron radiation source; Bismuth; Crystallization; Optical films; Reflectivity; Semiconductor films; Substrates; Synchrotron radiation; Titanium compounds; Transistors; X-ray diffraction; Anisotropy; Ceramics; Crystallography; Electric Impedance; Gels; Materials Testing; Membranes, Artificial; Molecular Conformation; Phase Transition; Powders; Silicon;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/TUFFC.2007.579
  • Filename
    4430043