DocumentCode
1034109
Title
Preferred crystal orientation of sol-gel-derived B4-xLaxTi3O12thin films on silicon substrates takayuki tajiri, kazushi sumitani, rie haruki, and atsushi kohno
Author
Tajiri, Takayuki ; Sumitani, Kazushi ; Haruki, Rie ; Kohno, Atsushi
Author_Institution
Fukuoka Univ., Fukuoka
Volume
54
Issue
12
fYear
2007
fDate
12/1/2007 12:00:00 AM
Firstpage
2574
Lastpage
2578
Abstract
Polycrystalline thin films of La-substituted bismuth titanate (BLT) were formed directly on p-type Si(100) substrates by using sol-gel and spin-coat methods. The BLT film and interfacial layer between BLT and Si were quantitatively investigated by the X-ray reflectivity method. Also, crystal orientations of sub-100-nm-thick BLT thin films were confirmed by X-ray diffraction using a synchrotron radiation source. The preferred c-axis orientation normal to the surface depended on the crystallization temperature. The difference in the preferred c-axis orientations of the BLT films caused the difference in the hysteresis voltage width in the capacitance-voltage characteristics of Au/BLT/p-Si structures. Furthermore, the c-axis of the Bi-layered structure was preferentially oriented and aligned in the in-plane direction.
Keywords
MIS structures; X-ray diffraction; X-ray reflection; bismuth compounds; crystal orientation; crystallisation; dielectric hysteresis; elemental semiconductors; ferroelectric thin films; ferroelectric transitions; gold; lanthanum compounds; reflectivity; silicon; sol-gel processing; spin coating; texture; Au-Bi4-xLaxTi3O12-Si; La-substituted bismuth titanate thin films; Si; X-ray diffraction; X-ray reflectivity method; bismuth layer-structured ferroelectrics; capacitance-voltage characteristics; crystallization temperature; hysteresis voltage; interfacial layer; metal-ferroelectric-semiconductor structures; polycrystalline thin films; preferred crystal orientation; silicon substrates; sol-gel methods; spin-coat methods; synchrotron radiation source; Bismuth; Crystallization; Optical films; Reflectivity; Semiconductor films; Substrates; Synchrotron radiation; Titanium compounds; Transistors; X-ray diffraction; Anisotropy; Ceramics; Crystallography; Electric Impedance; Gels; Materials Testing; Membranes, Artificial; Molecular Conformation; Phase Transition; Powders; Silicon;
fLanguage
English
Journal_Title
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/TUFFC.2007.579
Filename
4430043
Link To Document