• DocumentCode
    1034115
  • Title

    Low to high injections in double-diffused transistors

  • Author

    Huang, J.S.T.

  • Volume
    15
  • Issue
    11
  • fYear
    1968
  • fDate
    11/1/1968 12:00:00 AM
  • Firstpage
    940
  • Lastpage
    941
  • Abstract
    It is shown, in this correspondence, that the operation of most double-diffused transistors at all injection levels is equivalent to that of alloy devices with the effective doubling of the diffusion constant. Moreover, the base transit time of a double-diffused transistor exhibiting a fixed basewidth is nearly current-independent.
  • Keywords
    Current density; Impurities; Neodymium; Performance analysis;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1968.16539
  • Filename
    1475441