DocumentCode :
1034115
Title :
Low to high injections in double-diffused transistors
Author :
Huang, J.S.T.
Volume :
15
Issue :
11
fYear :
1968
fDate :
11/1/1968 12:00:00 AM
Firstpage :
940
Lastpage :
941
Abstract :
It is shown, in this correspondence, that the operation of most double-diffused transistors at all injection levels is equivalent to that of alloy devices with the effective doubling of the diffusion constant. Moreover, the base transit time of a double-diffused transistor exhibiting a fixed basewidth is nearly current-independent.
Keywords :
Current density; Impurities; Neodymium; Performance analysis;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16539
Filename :
1475441
Link To Document :
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