DocumentCode
1034115
Title
Low to high injections in double-diffused transistors
Author
Huang, J.S.T.
Volume
15
Issue
11
fYear
1968
fDate
11/1/1968 12:00:00 AM
Firstpage
940
Lastpage
941
Abstract
It is shown, in this correspondence, that the operation of most double-diffused transistors at all injection levels is equivalent to that of alloy devices with the effective doubling of the diffusion constant. Moreover, the base transit time of a double-diffused transistor exhibiting a fixed basewidth is nearly current-independent.
Keywords
Current density; Impurities; Neodymium; Performance analysis;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1968.16539
Filename
1475441
Link To Document