DocumentCode :
1034171
Title :
IGFET Analysis through numerical solution of Poisson´s equation
Author :
Schroeder, James E. ; Muller, Richard S.
Author_Institution :
University of California, Berkeley, Calif.
Volume :
15
Issue :
12
fYear :
1968
fDate :
12/1/1968 12:00:00 AM
Firstpage :
954
Lastpage :
961
Abstract :
Numerical techniques have been used to obtain the field distribution in IGFETs under saturated bias conditions. The numerical solution of Poisson´s equation is obtained with fewer simplifying assumptions than are necessary to obtain an analytic solution. The numerical solution is used to calculate the change in channel length as bias values are varied. These changes are used to predict the voltage dependences of drain current, drain conductance and transconductance in saturation. The potential solutions also permit a rough calculation of breakdown voltages. A comparison is made between the theoretical results and measurements on IGFETs of varying dimensions and doping concentrations.
Keywords :
Aluminum; Chemicals; Insulation; Phosphors; Poisson equations; Semiconductor films; Silicon; Springs; Thermal decomposition; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16545
Filename :
1475447
Link To Document :
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