DocumentCode :
1034197
Title :
Behavior of surface ions on semiconductor devices
Author :
Schlegel, Earl S. ; Schnable, George L. ; Schwarz, Ruth F. ; Spratt, James P.
Author_Institution :
Philco-Ford Corporation, Blue Bell, Pa.
Volume :
15
Issue :
12
fYear :
1968
fDate :
12/1/1968 12:00:00 AM
Firstpage :
973
Lastpage :
979
Abstract :
A study of the effects and behavior of surface ions on planar semiconductor devices has extended the theoretical understanding to include the case in which the total mobile surface ion density is determined by the net surface ion density induced by the surface potential on the oxide. We describe a useful test structure for the measurement of surface ion behavior and cite its advantages. We have measured the effects of time, humidity, temperature, voltage, and the previous testing history of the device on the behavior of surface ions.
Keywords :
Charge measurement; Conductivity; Current measurement; Equations; Humidity measurement; Semiconductor devices; Silicon; Snow; Testing; Time measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16548
Filename :
1475450
Link To Document :
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