Title :
Operation of major line bubble propagation path for Bloch line memory
Author :
Matsuyama, K. ; Chikamatsu, K. ; Tanaka, S. ; Suzuki, T.
Author_Institution :
Dept. of Electr. Eng., Kyushu Univ., Fukoka, Japan
fDate :
9/1/1989 12:00:00 AM
Abstract :
A novel type of current-access bubble propagation path for the major line of a vertical Bloch line memory has been designed and processed on an as-grown 5-μm bubble garnet film that is standard except for its thickness of 2.1 μm. The bubble propagation path consists of a meandering conductor and high-coercive-force hard magnetic patterns in CoPt which provide an offset force for the bubble motion. A reasonable bias field margin (14% of midbias field value) for the bubble propagation was measured in a test chip. The bias field compatibility between bubbles on the major line bubble propagation path and confined stripe domains for the minor loop have been confirmed experimentally
Keywords :
magnetic bubble memories; magnetic domain walls; 2.1 micron; 5 micron; Bloch line memory; CoPt; bias field compatibility; bias field margin; bubble motion; confined stripe domains; current-access bubble propagation path; high-coercive-force hard magnetic patterns; major line bubble propagation path; meandering conductor; minor loop; offset force; test chip; thickness; vertical Bloch line memory; Coercive force; Conducting materials; Conductive films; Conductors; Drives; Garnet films; Magnetic confinement; Process design; Strips; Testing;
Journal_Title :
Magnetics, IEEE Transactions on