• DocumentCode
    1035690
  • Title

    Operation of major line bubble propagation path for Bloch line memory

  • Author

    Matsuyama, K. ; Chikamatsu, K. ; Tanaka, S. ; Suzuki, T.

  • Author_Institution
    Dept. of Electr. Eng., Kyushu Univ., Fukoka, Japan
  • Volume
    25
  • Issue
    5
  • fYear
    1989
  • fDate
    9/1/1989 12:00:00 AM
  • Firstpage
    4248
  • Lastpage
    4250
  • Abstract
    A novel type of current-access bubble propagation path for the major line of a vertical Bloch line memory has been designed and processed on an as-grown 5-μm bubble garnet film that is standard except for its thickness of 2.1 μm. The bubble propagation path consists of a meandering conductor and high-coercive-force hard magnetic patterns in CoPt which provide an offset force for the bubble motion. A reasonable bias field margin (14% of midbias field value) for the bubble propagation was measured in a test chip. The bias field compatibility between bubbles on the major line bubble propagation path and confined stripe domains for the minor loop have been confirmed experimentally
  • Keywords
    magnetic bubble memories; magnetic domain walls; 2.1 micron; 5 micron; Bloch line memory; CoPt; bias field compatibility; bias field margin; bubble motion; confined stripe domains; current-access bubble propagation path; high-coercive-force hard magnetic patterns; major line bubble propagation path; meandering conductor; minor loop; offset force; test chip; thickness; vertical Bloch line memory; Coercive force; Conducting materials; Conductive films; Conductors; Drives; Garnet films; Magnetic confinement; Process design; Strips; Testing;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.42584
  • Filename
    42584