DocumentCode
1035690
Title
Operation of major line bubble propagation path for Bloch line memory
Author
Matsuyama, K. ; Chikamatsu, K. ; Tanaka, S. ; Suzuki, T.
Author_Institution
Dept. of Electr. Eng., Kyushu Univ., Fukoka, Japan
Volume
25
Issue
5
fYear
1989
fDate
9/1/1989 12:00:00 AM
Firstpage
4248
Lastpage
4250
Abstract
A novel type of current-access bubble propagation path for the major line of a vertical Bloch line memory has been designed and processed on an as-grown 5-μm bubble garnet film that is standard except for its thickness of 2.1 μm. The bubble propagation path consists of a meandering conductor and high-coercive-force hard magnetic patterns in CoPt which provide an offset force for the bubble motion. A reasonable bias field margin (14% of midbias field value) for the bubble propagation was measured in a test chip. The bias field compatibility between bubbles on the major line bubble propagation path and confined stripe domains for the minor loop have been confirmed experimentally
Keywords
magnetic bubble memories; magnetic domain walls; 2.1 micron; 5 micron; Bloch line memory; CoPt; bias field compatibility; bias field margin; bubble motion; confined stripe domains; current-access bubble propagation path; high-coercive-force hard magnetic patterns; major line bubble propagation path; meandering conductor; minor loop; offset force; test chip; thickness; vertical Bloch line memory; Coercive force; Conducting materials; Conductive films; Conductors; Drives; Garnet films; Magnetic confinement; Process design; Strips; Testing;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.42584
Filename
42584
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