DocumentCode :
1035800
Title :
Measurement of MOS current mismatch in the weak inversion region
Author :
Forti, Francesco ; Wright, Michael E.
Author_Institution :
Lawrence Berkeley Lab., CA, USA
Volume :
29
Issue :
2
fYear :
1994
fDate :
2/1/1994 12:00:00 AM
Firstpage :
138
Lastpage :
142
Abstract :
Measures the current matching properties of MOS transistors operated in the weak inversion region. The authors measured a total of about 1400 PMOS and NMOS transistors produced in four different processes and report the results in terms of mismatch dependance on current density, device dimensions, and substrate voltage, without using any specific model for the transistor
Keywords :
carrier density; insulated gate field effect transistors; inversion layers; MOS current mismatch; MOS transistors; NMOS transistors; PMOS transistors; current density; current matching properties; device dimensions; substrate voltage; weak inversion region; Circuits; Current density; Current measurement; Density measurement; Extraterrestrial measurements; Fluctuations; MOS devices; MOSFETs; Size measurement; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/4.272119
Filename :
272119
Link To Document :
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