DocumentCode :
1035957
Title :
Study of the inversion layer mobility and the improvement in gmof MOSFET
Author :
Nishi, Yoshio ; Tanaka, Kiyoshi
Volume :
16
Issue :
2
fYear :
1969
fDate :
2/1/1969 12:00:00 AM
Firstpage :
258
Lastpage :
258
Keywords :
Absorption; FETs; Laboratories; MOSFET circuits; Paramagnetic materials; Paramagnetic resonance; Quantization; Semiconductor device noise; Thermal resistance; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1969.16731
Filename :
1475773
Link To Document :
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