DocumentCode
1037351
Title
Complementary MOS—Bipolar transistor structure
Author
Lin, Hung Chang ; Ho, J.C. ; Iyer, Ramchandra R. ; Kwong, Ken
Author_Institution
Westinghouse Electric Corp., Elkridge, Md.
Volume
16
Issue
11
fYear
1969
fDate
11/1/1969 12:00:00 AM
Firstpage
945
Lastpage
951
Abstract
Bipolar transistors can be used to increase the driving capabilities of complementary MOS transistors while retaining the low power dissipation feature. The fabrication of n-p-n bipolar transistors is compatible with the fabrication of the complementary MOS transistors in a monolithic structure. Common collector n-p-n transistors can be fabricated using a diffused n+source-drain region as emitter, a diffused p-isolation region as base and an n-substrate as collector with a hfe greater than 100. Lateral n-p-n transistors can be fabricated using a diffused n+source-drain region as emitter and collector, and p-isolation region as base with a hfe greater than 10.
Keywords
Bipolar transistors; Electron devices; Fabrication; Hafnium; MOSFETs; Molecular electronics; NASA; Power dissipation; Substrates; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1969.16885
Filename
1475927
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