DocumentCode :
1037351
Title :
Complementary MOS—Bipolar transistor structure
Author :
Lin, Hung Chang ; Ho, J.C. ; Iyer, Ramchandra R. ; Kwong, Ken
Author_Institution :
Westinghouse Electric Corp., Elkridge, Md.
Volume :
16
Issue :
11
fYear :
1969
fDate :
11/1/1969 12:00:00 AM
Firstpage :
945
Lastpage :
951
Abstract :
Bipolar transistors can be used to increase the driving capabilities of complementary MOS transistors while retaining the low power dissipation feature. The fabrication of n-p-n bipolar transistors is compatible with the fabrication of the complementary MOS transistors in a monolithic structure. Common collector n-p-n transistors can be fabricated using a diffused n+source-drain region as emitter, a diffused p-isolation region as base and an n-substrate as collector with a hfegreater than 100. Lateral n-p-n transistors can be fabricated using a diffused n+source-drain region as emitter and collector, and p-isolation region as base with a hfegreater than 10.
Keywords :
Bipolar transistors; Electron devices; Fabrication; Hafnium; MOSFETs; Molecular electronics; NASA; Power dissipation; Substrates; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1969.16885
Filename :
1475927
Link To Document :
بازگشت