• DocumentCode
    1037351
  • Title

    Complementary MOS—Bipolar transistor structure

  • Author

    Lin, Hung Chang ; Ho, J.C. ; Iyer, Ramchandra R. ; Kwong, Ken

  • Author_Institution
    Westinghouse Electric Corp., Elkridge, Md.
  • Volume
    16
  • Issue
    11
  • fYear
    1969
  • fDate
    11/1/1969 12:00:00 AM
  • Firstpage
    945
  • Lastpage
    951
  • Abstract
    Bipolar transistors can be used to increase the driving capabilities of complementary MOS transistors while retaining the low power dissipation feature. The fabrication of n-p-n bipolar transistors is compatible with the fabrication of the complementary MOS transistors in a monolithic structure. Common collector n-p-n transistors can be fabricated using a diffused n+source-drain region as emitter, a diffused p-isolation region as base and an n-substrate as collector with a hfegreater than 100. Lateral n-p-n transistors can be fabricated using a diffused n+source-drain region as emitter and collector, and p-isolation region as base with a hfegreater than 10.
  • Keywords
    Bipolar transistors; Electron devices; Fabrication; Hafnium; MOSFETs; Molecular electronics; NASA; Power dissipation; Substrates; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1969.16885
  • Filename
    1475927