DocumentCode :
1037750
Title :
Uniformity of threshold voltage for MESFETs fabricated on VGF GaAs substrates
Author :
Reynolds, C.L. ; Gibson, W.C. ; Clemans, J.E.
Author_Institution :
AT&T Bell Laboratories, Reading, USA
Volume :
23
Issue :
23
fYear :
1987
Firstpage :
1222
Lastpage :
1223
Abstract :
Improved uniformity of threshold voltage is shown for MESFETs fabricated on GaAs substrates grown by a novel vertical gradient freeze technique when compared to devices fabricated on LEC GaAs substrates. The improved uniformity is most likely related to the decreased dislocation density and reduced impurity clustering in the VGF material.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; crystal growth from melt; gallium arsenide; semiconductor growth; GaAs substrates; LEC; MESFETs; improved uniformity; liquid encapsulated Czochralski crystals; threshold voltage; vertical gradient freeze technique;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19870851
Filename :
4259091
Link To Document :
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