Title :
Effect of minority carrier trapping on the low-temperature characteristics of Si transistors
Author_Institution :
IBM Watson Research Ctr., Yorktown Heights, N. Y.
fDate :
4/1/1970 12:00:00 AM
Abstract :
The effect of minority carrier traps on certain transistor characteristics is calculated. It is shown that trapping of electrons by donors in the base region of Si transistors can lead to the degradation with increasing temperature in β and fTof the type observed by Schlig on n-p-n Si transistors.
Keywords :
Degradation; Doping; Electromigration; Electron traps; Frequency; Impurities; Integrated circuit reliability; Logic devices; Power dissipation; Temperature dependence;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1970.16992