DocumentCode :
1038358
Title :
Effect of minority carrier trapping on the low-temperature characteristics of Si transistors
Author :
Dumke, W.P.
Author_Institution :
IBM Watson Research Ctr., Yorktown Heights, N. Y.
Volume :
17
Issue :
4
fYear :
1970
fDate :
4/1/1970 12:00:00 AM
Firstpage :
388
Lastpage :
389
Abstract :
The effect of minority carrier traps on certain transistor characteristics is calculated. It is shown that trapping of electrons by donors in the base region of Si transistors can lead to the degradation with increasing temperature in β and fTof the type observed by Schlig on n-p-n Si transistors.
Keywords :
Degradation; Doping; Electromigration; Electron traps; Frequency; Impurities; Integrated circuit reliability; Logic devices; Power dissipation; Temperature dependence;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1970.16992
Filename :
1476176
Link To Document :
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