DocumentCode
1038358
Title
Effect of minority carrier trapping on the low-temperature characteristics of Si transistors
Author
Dumke, W.P.
Author_Institution
IBM Watson Research Ctr., Yorktown Heights, N. Y.
Volume
17
Issue
4
fYear
1970
fDate
4/1/1970 12:00:00 AM
Firstpage
388
Lastpage
389
Abstract
The effect of minority carrier traps on certain transistor characteristics is calculated. It is shown that trapping of electrons by donors in the base region of Si transistors can lead to the degradation with increasing temperature in β and fT of the type observed by Schlig on n-p-n Si transistors.
Keywords
Degradation; Doping; Electromigration; Electron traps; Frequency; Impurities; Integrated circuit reliability; Logic devices; Power dissipation; Temperature dependence;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1970.16992
Filename
1476176
Link To Document