• DocumentCode
    1038358
  • Title

    Effect of minority carrier trapping on the low-temperature characteristics of Si transistors

  • Author

    Dumke, W.P.

  • Author_Institution
    IBM Watson Research Ctr., Yorktown Heights, N. Y.
  • Volume
    17
  • Issue
    4
  • fYear
    1970
  • fDate
    4/1/1970 12:00:00 AM
  • Firstpage
    388
  • Lastpage
    389
  • Abstract
    The effect of minority carrier traps on certain transistor characteristics is calculated. It is shown that trapping of electrons by donors in the base region of Si transistors can lead to the degradation with increasing temperature in β and fTof the type observed by Schlig on n-p-n Si transistors.
  • Keywords
    Degradation; Doping; Electromigration; Electron traps; Frequency; Impurities; Integrated circuit reliability; Logic devices; Power dissipation; Temperature dependence;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1970.16992
  • Filename
    1476176