Title :
Plasma techniques used for fabricating cryoelectric device arrays
Author_Institution :
Texas Instruments, Inc., Dallas, Tex.
fDate :
9/1/1968 12:00:00 AM
Keywords :
Josephson junction; Superconducting devices; Fabrication; Granular superconductors; Insulation; Plasma chemistry; Plasma devices; Plasma materials processing; Resists; Superconducting epitaxial layers; Superconducting films; Tunneling;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1968.1066349
