DocumentCode :
1039052
Title :
Thermal isolation of high-temperature superconducting thin films using silicon wafer bonding and micromachining
Author :
Bang, Christopher A. ; Rice, Joseph P. ; Flik, Markus I. ; Rudman, David A. ; Schmidt, Martin A.
Author_Institution :
Dept. of Mech. Eng., MIT, Cambridge, MA, USA
Volume :
2
Issue :
4
fYear :
1993
fDate :
12/1/1993 12:00:00 AM
Firstpage :
160
Lastpage :
164
Abstract :
Using a new micromachining technology, thermally isolated thin films of high-temperature superconductor have been microfabricated. The intended application for these structures is in infrared bolometers. A silicon wafer bonding process produces a low thermal mass island of single-crystal silicon on a silicon nitride membrane which provides thermal isolation. The silicon can act as a seed for the epitaxial growth of YBa2Cu3O7 on a yttria-stabilized zirconia buffer layer. This paper describes the overall concept of the thermally isolated device, and demonstrates that the micromachined structure can be fabricated with high-quality superconducting films
Keywords :
bolometers; high-temperature superconductors; microassembling; micromechanical devices; silicon; superconducting thin films; wafer bonding; IR bolometers; Si; Si3N4 membrane; YBa2Cu3O7; epitaxial growth; high-quality superconducting films; high-temperature superconducting thin films; infrared bolometers; low thermal mass island; micromachining; micromachining technology; silicon nitride membrane; silicon wafer bonding; silicon wafer bonding process; single-crystal silicon; thermal isolation; thermally isolated thin films; yttria-stabilized zirconia buffer layer; Biomembranes; Bolometers; Buffer layers; Epitaxial growth; High temperature superconductors; Isolation technology; Micromachining; Silicon; Superconducting thin films; Wafer bonding;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.273092
Filename :
273092
Link To Document :
بازگشت