• DocumentCode
    1039054
  • Title

    Thermal effects of the operation of high average power Gunn devices

  • Author

    Bravman, Joseph S. ; Eastman, Lester F.

  • Author_Institution
    Cornell University, Ithaca, N. Y.
  • Volume
    17
  • Issue
    9
  • fYear
    1970
  • fDate
    9/1/1970 12:00:00 AM
  • Firstpage
    744
  • Lastpage
    750
  • Abstract
    A lumped thermal resistance model is described for GaAs Gunn and LSA diodes. Thermal resistances are defined for the active layer, contact layer, bond interface, package and heat sink. This permits the calculation of tha maximum device temperature TM= T0+ P ΣiRiand the critical temperature difference across the active layer ΔTA= PRA. A transient analog incorporates thermal time constants Ti= RiCito consider high duty cycle pulsed operation. The carrier mobility is modeled as varying as 1/T in the range from 300 to 500°K. This permits thermal measurements based upon changes in resistance. The thermal calculations were also in agreement with blackbody infrared data. The mobility decline with temperature is shown to act as a link between the thermal profile and device performance. A thermally induced avalanching point, as well as device efficiency, are influenced by the peak-to-valley current ratio. This ratio is reduced from its theoretical value of over 2:1 by the active layer resistivity ratio \\bar{\\partial }/\\partial _{\\max } . Thus thermal gradients in the active layer act to create mobility gradients which alter the observed peak-to-valley ratio. The steps necessary for maintaining high average power efficient operation require low thermal resistances to minimize the active layer temperature gradients and a high current drop back ratio. Total experimental thermal resistances of 6.5°C/watt for an X-band CW diode and 17°C/watt for a thick LSA diode have been observed and fit the model presented.
  • Keywords
    Bonding; Diodes; Electrical resistance measurement; Gallium arsenide; Gunn devices; Heat sinks; Packaging; Resistance heating; Temperature; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1970.17067
  • Filename
    1476251