DocumentCode
1039713
Title
Origin of interfacial energy in coupled films of permalloy and cobalt
Author
Hirsch, A.A. ; Friedman, Nizan
Author_Institution
Technion-Israel Institute of Technology, Haifa, Israel.
Volume
5
Issue
3
fYear
1969
fDate
9/1/1969 12:00:00 AM
Firstpage
174
Lastpage
178
Abstract
The mechanism of magnetic coupling in multilayer films was investigated by analyzing the shape of the magnetoresistance hysteresis loops. A magnetic field was applied during the deposition of the layers in a high vacuum. Each film consisted of a soft layer of Ni-Fe and a hard layer of Co separated by intermediate laminations of SiO or Ag. The thickness of the intermediate lamination varied from 100 to about 5000 Å. The magnetoresistance hysteresis loop of the soft layer was displaced along the driving field axis. The displacement reaches a maximum value when the intermediate lamination has a thickness of about 700 Å and seems to be caused by a negative magnetic coupling. It was also found that the material of the intermediate lamination does not materially alter the characteristics of the films. Both phenomena were discussed in terms of magnetostatic interactions between uniaxial single-domain particles. The explanation for the interfacial energy based on long-range interactions points out that short-range interactions between the separated layers can be neglected.
Keywords
Cobalt films; Multilayer magnetic films; Permalloy films; Cobalt; Couplings; Lamination; Magnetic analysis; Magnetic films; Magnetic hysteresis; Magnetic multilayers; Magnetic separation; Magnetoresistance; Magnetostatics;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1969.1066468
Filename
1066468
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