DocumentCode :
1039929
Title :
Thermal breakdown delay time in silicon p-n junctions
Author :
Fleming, Daniel J.
Author_Institution :
Syracuse University, Syracuse, N. Y.
Volume :
18
Issue :
2
fYear :
1971
fDate :
2/1/1971 12:00:00 AM
Firstpage :
94
Lastpage :
97
Abstract :
The geometric effects on the applied power dependence of the delay time preceding thermal breakdown in p-n junctions are predicted in terms of a linear heat-flow model and temperature-dependent reverse current. Measurements of the delay time on silicon planar p-n junctions of various areas are compared to the predictions and found to be in reasonable accord.
Keywords :
Breakdown voltage; Current density; Delay effects; Electric breakdown; Helium; P-n junctions; Silicon; Slabs; Temperature; Thermal conductivity;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1971.17155
Filename :
1476477
Link To Document :
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