• DocumentCode
    1040094
  • Title

    Transition region capacitance of diffused p-n junctions

  • Author

    Chawla, Basant R. ; Gummel, Hermann K.

  • Author_Institution
    Bell Telephone Laboratories, Inc., Murray Hill, N. J.
  • Volume
    18
  • Issue
    3
  • fYear
    1971
  • fDate
    3/1/1971 12:00:00 AM
  • Firstpage
    178
  • Lastpage
    195
  • Abstract
    The classical capacitance-voltage relations based on abrupt space-charge edge approximations, while adequate at large reverse bias, do not adequately describe the capacitance near zero bias. This paper presents explicit capacitance-voltage relations valid near zero bias for linearly graded and exponential-constant profiles. For linearly graded junctions, the intercept in a 1/C3versus voltage plot is shown to be well approximated by the "gradient voltage" defined by Vg= 2/3 kT/q ln a2εkT/q/8qni3. Also presented is an accurate numerical technique for machine computation of the transition region capacitance for any doping profile. Explicit relations obtained by dimensional considerations and curve fitting on numerical solutions are free of singularities, hence useful in computer-aided device design and doping profile determination.
  • Keywords
    Capacitance; Capacitance-voltage characteristics; Curve fitting; Doping profiles; Helium; P-n junctions; Semiconductor impurities; Telephony; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1971.17172
  • Filename
    1476494