DocumentCode :
1040094
Title :
Transition region capacitance of diffused p-n junctions
Author :
Chawla, Basant R. ; Gummel, Hermann K.
Author_Institution :
Bell Telephone Laboratories, Inc., Murray Hill, N. J.
Volume :
18
Issue :
3
fYear :
1971
fDate :
3/1/1971 12:00:00 AM
Firstpage :
178
Lastpage :
195
Abstract :
The classical capacitance-voltage relations based on abrupt space-charge edge approximations, while adequate at large reverse bias, do not adequately describe the capacitance near zero bias. This paper presents explicit capacitance-voltage relations valid near zero bias for linearly graded and exponential-constant profiles. For linearly graded junctions, the intercept in a 1/C3versus voltage plot is shown to be well approximated by the "gradient voltage" defined by Vg= 2/3 kT/q ln a2εkT/q/8qni3. Also presented is an accurate numerical technique for machine computation of the transition region capacitance for any doping profile. Explicit relations obtained by dimensional considerations and curve fitting on numerical solutions are free of singularities, hence useful in computer-aided device design and doping profile determination.
Keywords :
Capacitance; Capacitance-voltage characteristics; Curve fitting; Doping profiles; Helium; P-n junctions; Semiconductor impurities; Telephony; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1971.17172
Filename :
1476494
Link To Document :
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