DocumentCode
1040143
Title
Selective Transfer Technology for Microdevice Distribution
Author
Guerre, Roland ; Drechsler, Ute ; Jubin, Daniel ; Despont, Michel
Author_Institution
IBM Res. GmbH, Ruschlikon
Volume
17
Issue
1
fYear
2008
Firstpage
157
Lastpage
165
Abstract
We have developed a generic cost-efficient CMOS-compatible heterogeneous device integration method at wafer-scale level. This method enables the distribution of devices from one to numerous wafers using selective transfer technology. We have applied this method for the distribution of atomic force microscopy (AFM) cantilevers and successfully demonstrated the population of multiple wafers from one source wafer. The distribution function has been designed such as to populate 42 wafers with only one source wafer. This CMOS back-end-of-the-line compatible method is particularly suitable for microelectromechanical systems and integrated circuits. Electrical interconnects are compatible with this technology. We present the concept, the selective transfer method, including a laser ablation technique used for the transfer, as well as the process and results of the application for AFM cantilever distribution.
Keywords
CMOS integrated circuits; atomic force microscopy; cantilevers; laser ablation; micromechanical devices; wafer-scale integration; CMOS back-end-of-the-line compatible method; atomic force microscopy cantilevers; heterogeneous device integration method; integrated circuits; laser ablation technique; microdevice distribution; microelectromechanical systems; selective transfer technology; wafer-scale level; Atomic force microscopy (AFM); heterogeneous device integration; systems-on-chip; wafer-scale 3-D integration;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2007.911370
Filename
4435064
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