DocumentCode :
1040143
Title :
Selective Transfer Technology for Microdevice Distribution
Author :
Guerre, Roland ; Drechsler, Ute ; Jubin, Daniel ; Despont, Michel
Author_Institution :
IBM Res. GmbH, Ruschlikon
Volume :
17
Issue :
1
fYear :
2008
Firstpage :
157
Lastpage :
165
Abstract :
We have developed a generic cost-efficient CMOS-compatible heterogeneous device integration method at wafer-scale level. This method enables the distribution of devices from one to numerous wafers using selective transfer technology. We have applied this method for the distribution of atomic force microscopy (AFM) cantilevers and successfully demonstrated the population of multiple wafers from one source wafer. The distribution function has been designed such as to populate 42 wafers with only one source wafer. This CMOS back-end-of-the-line compatible method is particularly suitable for microelectromechanical systems and integrated circuits. Electrical interconnects are compatible with this technology. We present the concept, the selective transfer method, including a laser ablation technique used for the transfer, as well as the process and results of the application for AFM cantilever distribution.
Keywords :
CMOS integrated circuits; atomic force microscopy; cantilevers; laser ablation; micromechanical devices; wafer-scale integration; CMOS back-end-of-the-line compatible method; atomic force microscopy cantilevers; heterogeneous device integration method; integrated circuits; laser ablation technique; microdevice distribution; microelectromechanical systems; selective transfer technology; wafer-scale level; Atomic force microscopy (AFM); heterogeneous device integration; systems-on-chip; wafer-scale 3-D integration;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2007.911370
Filename :
4435064
Link To Document :
بازگشت