• DocumentCode
    1040143
  • Title

    Selective Transfer Technology for Microdevice Distribution

  • Author

    Guerre, Roland ; Drechsler, Ute ; Jubin, Daniel ; Despont, Michel

  • Author_Institution
    IBM Res. GmbH, Ruschlikon
  • Volume
    17
  • Issue
    1
  • fYear
    2008
  • Firstpage
    157
  • Lastpage
    165
  • Abstract
    We have developed a generic cost-efficient CMOS-compatible heterogeneous device integration method at wafer-scale level. This method enables the distribution of devices from one to numerous wafers using selective transfer technology. We have applied this method for the distribution of atomic force microscopy (AFM) cantilevers and successfully demonstrated the population of multiple wafers from one source wafer. The distribution function has been designed such as to populate 42 wafers with only one source wafer. This CMOS back-end-of-the-line compatible method is particularly suitable for microelectromechanical systems and integrated circuits. Electrical interconnects are compatible with this technology. We present the concept, the selective transfer method, including a laser ablation technique used for the transfer, as well as the process and results of the application for AFM cantilever distribution.
  • Keywords
    CMOS integrated circuits; atomic force microscopy; cantilevers; laser ablation; micromechanical devices; wafer-scale integration; CMOS back-end-of-the-line compatible method; atomic force microscopy cantilevers; heterogeneous device integration method; integrated circuits; laser ablation technique; microdevice distribution; microelectromechanical systems; selective transfer technology; wafer-scale level; Atomic force microscopy (AFM); heterogeneous device integration; systems-on-chip; wafer-scale 3-D integration;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2007.911370
  • Filename
    4435064