• DocumentCode
    1040404
  • Title

    Threshold voltage variations with temperature in MOS transistors

  • Author

    Wang, Ruiqi ; Dunkley, J. ; DeMassa, T.A.

  • Volume
    18
  • Issue
    6
  • fYear
    1971
  • fDate
    6/1/1971 12:00:00 AM
  • Firstpage
    386
  • Lastpage
    388
  • Abstract
    Variations with temperature in the threshold voltage of n- and p-channel MOS transistors are obtained by calculation as well as measurement, with the results comparing quite closely. The amount of voltage change per °C under normal operating conditions is found to be dependent upon the channel doping concentration. The calculations show that for either n- or p-channel devices the voltage change per °C is -4 mV/°C for an impurity concentration of 3 × 1016/cm3and -2 mV/°C for an impurity concentration of 1015/cm3. This information is important because if the MOS transistor is subjected to a changing temperature environment, the accompanying threshold voltage change may be intolerable.
  • Keywords
    Electrons; Energy states; Equations; Impurities; MOSFETs; Neodymium; Semiconductor materials; Silicon; Temperature; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1971.17207
  • Filename
    1476529