DocumentCode :
1040404
Title :
Threshold voltage variations with temperature in MOS transistors
Author :
Wang, Ruiqi ; Dunkley, J. ; DeMassa, T.A.
Volume :
18
Issue :
6
fYear :
1971
fDate :
6/1/1971 12:00:00 AM
Firstpage :
386
Lastpage :
388
Abstract :
Variations with temperature in the threshold voltage of n- and p-channel MOS transistors are obtained by calculation as well as measurement, with the results comparing quite closely. The amount of voltage change per °C under normal operating conditions is found to be dependent upon the channel doping concentration. The calculations show that for either n- or p-channel devices the voltage change per °C is -4 mV/°C for an impurity concentration of 3 × 1016/cm3and -2 mV/°C for an impurity concentration of 1015/cm3. This information is important because if the MOS transistor is subjected to a changing temperature environment, the accompanying threshold voltage change may be intolerable.
Keywords :
Electrons; Energy states; Equations; Impurities; MOSFETs; Neodymium; Semiconductor materials; Silicon; Temperature; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1971.17207
Filename :
1476529
Link To Document :
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