DocumentCode
1041139
Title
Practical approach to determining charge collected in multi-junction structure due to the ion shunt effect
Author
Brown, Alexander O. ; Bhuva, Bharat ; Kerns, S.E. ; Stapor, W.J.
Author_Institution
Dept. of Electr. Eng., Vanderbilt Univ., Nashville, TN, USA
Volume
40
Issue
6
fYear
1993
fDate
12/1/1993 12:00:00 AM
Firstpage
1918
Lastpage
1925
Abstract
Presents the algorithms and results of a computer program used to determine the charge collected on silicon semiconductor transistors due to the ion shunt effect. The authors present results for a typical silicon CMOS structure and discuss the effects of voltage, ion energy, and structure on the charge collected. The computer program uses an algorithm to produce a realistic e -h pair distribution. This initial distribution is shown to greatly affect the amount of charge collected. Therefore, typical simulators that assume uniform and energy-independent distributions will be inaccurate. The program determines the e -h distributions with respect to time by solving the ambipolar diffusion equation at various depths within the shunt. From the e -h pair distributions, the time-dependent resistances can be determined and the collected charge can be determined as a function of time
Keywords
CMOS integrated circuits; charge measurement; integrated circuit testing; ion beam effects; CMOS structure; ambipolar diffusion equation; charge collection measurement; computer program; e-h pair distribution; energy-independent distributions; ion shunt effect; multi-junction structure; silicon semiconductor transistors; Charge carrier processes; Circuits; Computational modeling; Conductivity; Laboratories; Physics; Semiconductor devices; Shunt (electrical); Silicon; Single event upset;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.273463
Filename
273463
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