DocumentCode
1041407
Title
The influence of debye length on the C-V measurement of doping profiles
Author
Johnson, Walter C. ; Panousis, Peter T.
Volume
18
Issue
10
fYear
1971
fDate
10/1/1971 12:00:00 AM
Firstpage
965
Lastpage
973
Abstract
The doping profile of a semiconductor is given only approximately by the conventional analysis of
measurements. The present study employs computer simulation of semiconductors with one-sided doping profiles that consist of high and low doped sections joined by steps and linear ramps. The computation yields the apparent doping profile that would be obtained by the conventional use of
data, and this result is compared with the actual profile, with the majority-carrier distribution, and with the outcome of a correction previously proposed in the literature. The results show that a step in the profile cannot be resolved satisfactorily to less than several Debye lengths corresponding to the doping on the high side of the profile. A ramp cannot be distinguished accurately from a step unless its width is appreciably greater than a Debye length. Furthermore, the apparent doping profile is not identical with the majority-carrier distribution with contacts far away, as has been suggested, and the discrepancy is shown to depend on the side from which depletion is done.
measurements. The present study employs computer simulation of semiconductors with one-sided doping profiles that consist of high and low doped sections joined by steps and linear ramps. The computation yields the apparent doping profile that would be obtained by the conventional use of
data, and this result is compared with the actual profile, with the majority-carrier distribution, and with the outcome of a correction previously proposed in the literature. The results show that a step in the profile cannot be resolved satisfactorily to less than several Debye lengths corresponding to the doping on the high side of the profile. A ramp cannot be distinguished accurately from a step unless its width is appreciably greater than a Debye length. Furthermore, the apparent doping profile is not identical with the majority-carrier distribution with contacts far away, as has been suggested, and the discrepancy is shown to depend on the side from which depletion is done.Keywords
Capacitance; Capacitance-voltage characteristics; Charge carriers; Computer simulation; Distributed computing; Doping profiles; Laboratories; Length measurement; P-n junctions; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1971.17311
Filename
1476633
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