DocumentCode :
1041434
Title :
Charge generation and collection in p-n junctions excited with pulsed infrared lasers
Author :
Johnston, A.H.
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Volume :
40
Issue :
6
fYear :
1993
fDate :
12/1/1993 12:00:00 AM
Firstpage :
1694
Lastpage :
1702
Abstract :
The author examines optical absorption processes for applications of infrared lasers to the simulation of single-particle effects in silicon and GaAs, which require that the laser is focused to a small area on the device surface. The resulting charge generation is compared with charge generation from heavy ions. Charge funneling is reduced in silicon structures because of the lower charge density unless the LET (linear energy transfer) is above a threshold value. In both materials, the effective LET of a laser is inherently nonlinear because of nonlinear absorption at high intensities. These factors limit quantitative comparisons between lasers and heavy ions, and are increasingly important as devices are scaled to smaller dimensions
Keywords :
III-V semiconductors; carrier density; elemental semiconductors; energy gap; gallium arsenide; laser beam effects; light absorption; p-n homojunctions; silicon; CMOS structure; GaAs; LET; Si; bandgap narrowing; carrier density; charge density; charge funneling; charge generation; device scaling; linear energy transfer; nonlinear absorption; optical absorption processes; p-n junctions; pulsed infrared lasers; simulation; single-particle effects; Electromagnetic wave absorption; Gallium arsenide; Laser applications; Laser excitation; Nonlinear optics; Optical devices; P-n junctions; Particle beam optics; Silicon; Surface emitting lasers;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.273491
Filename :
273491
Link To Document :
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