• DocumentCode
    1041637
  • Title

    Soft magnetic thin-film memory materials

  • Author

    Freedman, James F.

  • Author_Institution
    T. J. Watson Research Division, IBM Corporation, Yorktown Heights, N.Y.
  • Volume
    5
  • Issue
    4
  • fYear
    1969
  • fDate
    12/1/1969 12:00:00 AM
  • Firstpage
    752
  • Lastpage
    764
  • Abstract
    Thin-film deposition techniques as applied to magnetic memory applications are reviewed. The relationship between the microstructure of the film and the fabrication technique and pertinent parameters is discussed in terms of the atomistics of film nucleation and growth. The dependence of the magnetic properties governing switching of a magnetic storage element is qualitatively discussed in terms of the microstructure and ripple theory; literature data is used to elucidate this by showing the effects of composition, temperature, thickness, and substrate morphology on the magnetic properties. The literature values for the anisotropy field, coercivity field, and dispersion of various classes of ternary alloys is reviewed, extending previous papers reviewing elemental and binary alloys.
  • Keywords
    Magnetic film memories; Soft magnetic materials; Atomic layer deposition; Fabrication; Magnetic films; Magnetic materials; Magnetic memory; Magnetic properties; Magnetic switching; Microstructure; Soft magnetic materials; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1969.1066650
  • Filename
    1066650