DocumentCode
1041637
Title
Soft magnetic thin-film memory materials
Author
Freedman, James F.
Author_Institution
T. J. Watson Research Division, IBM Corporation, Yorktown Heights, N.Y.
Volume
5
Issue
4
fYear
1969
fDate
12/1/1969 12:00:00 AM
Firstpage
752
Lastpage
764
Abstract
Thin-film deposition techniques as applied to magnetic memory applications are reviewed. The relationship between the microstructure of the film and the fabrication technique and pertinent parameters is discussed in terms of the atomistics of film nucleation and growth. The dependence of the magnetic properties governing switching of a magnetic storage element is qualitatively discussed in terms of the microstructure and ripple theory; literature data is used to elucidate this by showing the effects of composition, temperature, thickness, and substrate morphology on the magnetic properties. The literature values for the anisotropy field, coercivity field, and dispersion of various classes of ternary alloys is reviewed, extending previous papers reviewing elemental and binary alloys.
Keywords
Magnetic film memories; Soft magnetic materials; Atomic layer deposition; Fabrication; Magnetic films; Magnetic materials; Magnetic memory; Magnetic properties; Magnetic switching; Microstructure; Soft magnetic materials; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1969.1066650
Filename
1066650
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