DocumentCode
1041760
Title
hFE falloff at low temperatures
Author
Gopen, Howard J. ; Yu, Albert Y C
Author_Institution
Intel Corporation, Mountain View, Calif.
Volume
18
Issue
12
fYear
1971
fDate
12/1/1971 12:00:00 AM
Firstpage
1146
Lastpage
1148
Abstract
It is shown that for shallow planar bipolar transistors, tunneling, currents through the emitter-base junction can cause pronounced hFE falloff at low temperatures.
Keywords
Bipolar transistors; Cameras; Helium; Instruments; Iron; Laboratories; Microwave transistors; Research and development; Temperature dependence; Tunneling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1971.17345
Filename
1476667
Link To Document