• DocumentCode
    1042025
  • Title

    D-MOS transistor for microwave applications

  • Author

    Sigg, Hans J. ; Vendelin, George D. ; Cauge, Thomas P. ; Kocsis, Joseph

  • Author_Institution
    Signetics Corporation, Sunnyvale, Calif.
  • Volume
    19
  • Issue
    1
  • fYear
    1972
  • fDate
    1/1/1972 12:00:00 AM
  • Firstpage
    45
  • Lastpage
    53
  • Abstract
    A new n-channel silicon MOS transistor is described that can be fabricated with channel lengths of less than 1 µ by using a double-diffusion process similar to that used in bipolar transistor fabrication. The dimensional tolerances are not tighter than those used in the processing of conventional MOS transistors. This device (called D-MOST) shows gain in the GHz range and a noise figure comparable to that of microwave transistors. The fmaxis 10 GHz and the noise figure is 4.0 dB at 1 GHz. A brief theory of the D-MOST is followed by the design considerations for a discrete microwave device. Results from s-parameter measurements in the range of 0.1-2.5 GHz are presented along with graphs showing the gains and the stability factor. A simple equivalent circuit is derived from the measurements. Applications of the D-MOST are described.
  • Keywords
    Bipolar transistors; Fabrication; Gain measurement; MOSFETs; Microwave devices; Microwave theory and techniques; Microwave transistors; Noise figure; Scattering parameters; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1972.17370
  • Filename
    1476841