DocumentCode :
1043113
Title :
Drain current DLTS of AlGaN-GaN MIS-HEMTs
Author :
Okino, T. ; Ochiai, M. ; Ohno, Y. ; Kishimoto, S. ; Maezawa, K. ; Mizutani, T.
Author_Institution :
Dept. of Quantum Eng., Nagoya Univ., Japan
Volume :
25
Issue :
8
fYear :
2004
Firstpage :
523
Lastpage :
525
Abstract :
The transient behavior of AlGaN-GaN MIS-HEMTs were studied by drain current deep level transient spectroscopy. Two electron traps were observed, one of which had similar activation energy to that of defect that was commonly observed in epitaxial GaN. We compared the results with those of AlGaN-GaN HEMTs. The hole-trap-like positive peaks in the DLTS, which were observed in the HEMTs, were not observed in the MIS-HEMTs. It has been pointed out that the positive peaks did not originate from change in hole trap population in the channel but reflected the change in the electron population in the surface states of the HEMT access regions. The gate insulator was effective to suppress not only the gate leakage current but also the surface-state-related signals.
Keywords :
III-V semiconductors; MIS devices; MISFET; aluminium compounds; deep level transient spectroscopy; electron traps; gallium compounds; high electron mobility transistors; hole traps; semiconductor epitaxial layers; surface states; wide band gap semiconductors; AlGaN-GaN; AlGaN-GaN MIS-HEMT; HEMT access regions; activation energy; drain current DLTS; drain current deep level transient spectroscopy; electron population; electron traps; epitaxial GaN; gate insulator; gate leakage current; hole trap population; hole-trap-like positive peaks; surface states; transient behavior; Chemical technology; Educational technology; Electron traps; HEMTs; Insulation; Leakage current; MODFETs; Pulse measurements; Silicon compounds; Spectroscopy; AlGaN–GaN MIS-HEMTs; current DLTS; hole-trap-like; surface states;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2004.832788
Filename :
1317013
Link To Document :
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