Free charge transfer in charge-coupled devices

The free charge-transfer characteristics of charge-coupled devices (CCD´s) are analyzed in terms of the charge motion due to thermal diffusion, self-induced drift, and fringing field drift. The charge-coupled structures considered have separations between the gates equal to the thickness of the channel oxide. The effect of each of the above mechanisms on charge transfer is first considered separately, and a new method is presented for the calculation of the self-induced field. Then the results of a computer simulation of the charge-transfer process that simultaneously considers all three charge-motion mechanisms is presented for three-phase CCD´s with gate lengths of 4 and 10 µ. The analysis shows that while the majority of the charge is transferred by means of the self-induced drift that follows a hyperbolic time dependence, the last few percent of the charge decays exponentially under the influence of the fringing field drift or thermal diffusion, depending on the design of the structure. The analysis shows that in CCD´s made on relatively high resistivity substrates, the transfer by fringing-field drift can be very fast, such that transfer efficiencies of 99.99 percent are expected at 5- to 10- MHz bit rates for 10-µ gate lengths and at up to 100 MHz for 4-µ gate lengths.