DocumentCode :
1043315
Title :
Properties of MNOS structures
Author :
Lundström, K. Ingemar ; Svensson, Christer M.
Author_Institution :
Chalmers University of Technology, Gothenburg, Sweden
Volume :
19
Issue :
6
fYear :
1972
fDate :
6/1/1972 12:00:00 AM
Firstpage :
826
Lastpage :
836
Abstract :
The properties of thin oxide MNOS structures are studied. An analytical theory for the switching time constant is derived and curves of the switching time constant versus the nitride field are computed. These curves are useful in the design of MNOS-memory transistors. The theory is compared with experiments. The normal current in the thin oxide MNOS structures is assumed to be a modified Fowler-Nordheim current. At small oxide thicknesses and low nitride field, an additional current is shown to exist that is attributed to direct tunneling into traps in the nitride. The discharge of MNOS structures is briefly discussed and is shown to be due to a direct tunneling of charge carriers from traps in the nitride into the semiconductor.
Keywords :
Charge carrier processes; Conductors; Dielectrics and electrical insulation; Electron traps; Permittivity; Radiative recombination; Region 1; Spontaneous emission; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1972.17500
Filename :
1476971
Link To Document :
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