• DocumentCode
    1043566
  • Title

    Numerical investigation of the thyristor forward characteristic

  • Author

    Cornu, Jozef ; Lietz, Manfred

  • Author_Institution
    Brown Boveri Research Center, Baden, Switzerland
  • Volume
    19
  • Issue
    8
  • fYear
    1972
  • fDate
    8/1/1972 12:00:00 AM
  • Firstpage
    975
  • Lastpage
    981
  • Abstract
    Analytical solutions for the forward characteristic of thyristors have been limited to abrupt and constant doping profiles. Average values for the mobilities and the carrier lifetime had to be assumed for each region of the device. Results will be presented here which are based on an exact numerical solution of the transport, continuity, and Poisson equations for the one-dimensional thyristor. Doping, mobility, and lifetime can be varied from point to point. Thyristor structures are much wider and higher doped than the devices treated numerically in the literature. The dependency of the forward characteristic on various device parameters was examined, and the important results were verified experimentally. For high current and a base width that is large compared to the diffusion length, the dependency of mobility on the carrier concentration leads to a base voltage drop significantly lower than that expected from analytical theory. Furthermore, it is shown that for this case the parameters of the highly doped side regions (doping, width, and lifetime) have much less influence than predicted from Herlet´s [3] theory.
  • Keywords
    Charge carrier lifetime; Doping profiles; Electrons; Helium; Poisson equations; Semiconductor device doping; Semiconductor process modeling; Steady-state; Thyristors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1972.17527
  • Filename
    1476998