DocumentCode :
1043953
Title :
Bipolar junction transistors fabricated in silicon-on-sapphire
Author :
Garcia, Gaetan
Volume :
28
Issue :
11
fYear :
1992
fDate :
5/21/1992 12:00:00 AM
Firstpage :
983
Lastpage :
985
Abstract :
The effects of processing temperature on collector leakage current in bipolar junction transistors (BJTs) fabricated in silicon-on-sapphire (SOS) were examined. At low process temperatures (850 degrees C) a reduction of five orders of magnitude in the collector leakage current was observed. Excellent I-V characteristics were obtained on both NPN and PNP transistors fabricated at lower temperatures. Measured DC current gain beta for the NPN devices was 30, and that of the PNP devices was 40. Additionally, current mode logic (CML) circuits fabricated using these transistors exhibited well behaved DC switching characteristics.
Keywords :
bipolar integrated circuits; bipolar transistors; emitter-coupled logic; semiconductor-insulator boundaries; 850 C; CML; DC current gain; DC switching characteristics; I-V characteristics; NPN devices; PNP devices; Si-Al 2O 3; bipolar junction transistors; collector leakage current; complementary bipolar transistors; current mode logic; processing temperature; silicon-on-sapphire; vertical bipolar transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19920625
Filename :
274675
Link To Document :
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