• DocumentCode
    1044157
  • Title

    The effect of annealing on sputtered GdIG films

  • Author

    Josephs, Richard M.

  • Author_Institution
    UNIVAC Division, Sperry Rand Corporation, Philadelphia, Pa
  • Volume
    6
  • Issue
    3
  • fYear
    1970
  • fDate
    9/1/1970 12:00:00 AM
  • Firstpage
    553
  • Lastpage
    558
  • Abstract
    Polycrystalline and single crystal films of GdIG were produced on a variety of substrates by RF sputtering and subsequent annealing. The effects of this annealing on the film properties are discussed. The deviation of the lattice parameters from the ideal value of 12.47 Å was consistent with the strain produced by the mismatch in the thermal expansion coefficients. Optical absorption measurements indicated that the as-sputtered films contained both Fe2+and Fe3+ions. The coercive force ( T-T_{c} ) degrees above the compensation point did not depend upon the type of substrate or heat treatment. The temperature dependence of the Faraday rotation was consistent with the presence of a distribution in compensation points throughout the film. Films on YAG were subjected to varying heat treatments, and it was found that the average compensation temperature Tcof a given film depended on the nature of the anneal. The behavior of the film upon annealing can be explained by a model in which the film successively experiences nucleation and grain growth, oxidation, and Al diffusion.
  • Keywords
    Annealing; GdIG films; Annealing; Capacitive sensors; Heat treatment; Iron; Lattices; Optical films; Radio frequency; Sputtering; Substrates; Temperature dependence;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1970.1066879
  • Filename
    1066879