DocumentCode
1044157
Title
The effect of annealing on sputtered GdIG films
Author
Josephs, Richard M.
Author_Institution
UNIVAC Division, Sperry Rand Corporation, Philadelphia, Pa
Volume
6
Issue
3
fYear
1970
fDate
9/1/1970 12:00:00 AM
Firstpage
553
Lastpage
558
Abstract
Polycrystalline and single crystal films of GdIG were produced on a variety of substrates by RF sputtering and subsequent annealing. The effects of this annealing on the film properties are discussed. The deviation of the lattice parameters from the ideal value of 12.47 Å was consistent with the strain produced by the mismatch in the thermal expansion coefficients. Optical absorption measurements indicated that the as-sputtered films contained both Fe2+and Fe3+ions. The coercive force (
) degrees above the compensation point did not depend upon the type of substrate or heat treatment. The temperature dependence of the Faraday rotation was consistent with the presence of a distribution in compensation points throughout the film. Films on YAG were subjected to varying heat treatments, and it was found that the average compensation temperature Tc of a given film depended on the nature of the anneal. The behavior of the film upon annealing can be explained by a model in which the film successively experiences nucleation and grain growth, oxidation, and Al diffusion.
) degrees above the compensation point did not depend upon the type of substrate or heat treatment. The temperature dependence of the Faraday rotation was consistent with the presence of a distribution in compensation points throughout the film. Films on YAG were subjected to varying heat treatments, and it was found that the average compensation temperature TKeywords
Annealing; GdIG films; Annealing; Capacitive sensors; Heat treatment; Iron; Lattices; Optical films; Radio frequency; Sputtering; Substrates; Temperature dependence;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1970.1066879
Filename
1066879
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