DocumentCode :
1044218
Title :
Subthreshold and above threshold gate current in heterostructure insulated gate field-effect transistors
Author :
Schuermeyer, F. ; Martinez, E. ; Shur, M. ; Grider, David ; Nohava, J.
Author_Institution :
Wright Lab., Wright Patterson AFB, OH, USA
Volume :
28
Issue :
11
fYear :
1992
fDate :
5/21/1992 12:00:00 AM
Firstpage :
1024
Lastpage :
1026
Abstract :
Experimental data are presented which show that the gate current at zero drain bias in HIGFETs changes qualitatively when the gate voltage is varied from below to above threshold. Above threshold, the gate current flows from the entire channel, and below threshold, the gate current flows from the gate edges. A new independent method for deducing threshold old voltage is introduced.
Keywords :
insulated gate field effect transistors; leakage currents; 0.6 to 1 micron; AlGaAs-GaAs; HIGFETs; above threshold gate current; gate length; gate voltage; heterostructure insulated gate field-effect transistors; subthreshold gate current; threshold old voltage; zero drain bias;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19920650
Filename :
274700
Link To Document :
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