• DocumentCode
    1044303
  • Title

    Computer analysis on the static negative resistance due to the geometrical effect of a GaAs bulk element

  • Author

    Tomizawa, Kazutaka ; Tateno, Hiroshi ; Kataoka, Shoei

  • Author_Institution
    Meiji University, Tokyo, Japan
  • Volume
    19
  • Issue
    12
  • fYear
    1972
  • fDate
    12/1/1972 12:00:00 AM
  • Firstpage
    1299
  • Lastpage
    1300
  • Abstract
    Results of computer analysis on the static negative resistance of a GaAs bulk element with a geometrical effect are presented. It is shown that a static negative resistance appears across an overcritically doped GaAs element with a geometry of expanding cross section toward the anode as a result of the development of a stationary high-field domain at the expanding part of the element. These results are in good agreement with the reported experimental results.
  • Keywords
    Anodes; Cathodes; Doping; Electrons; Gallium arsenide; Geometry; Gunn devices; Semiconductor diodes; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1972.17597
  • Filename
    1477068