DocumentCode :
1044856
Title :
New functional field-effect transistor based on wavefunction modulation in delta -doped double quantum wells
Author :
Ohno, Y. ; Tsuchiya, Masahiro ; Sakaki, H.
Author_Institution :
Inst. of Ind. Sci., Tokyo Univ., Japan
Volume :
29
Issue :
4
fYear :
1993
Firstpage :
375
Lastpage :
376
Abstract :
Novel field-effect transistor characteristics are demonstrated by using impurity-inserted double quantum wells. By controlling the resonant coupling with gate voltage, electron wavefunctions are delocalised or localised, resulting in the enhancement or suppression of ionised impurity scattering. Multifunctional performance including a large negative transconductance and frequency-multiplier action is realised.
Keywords :
III-V semiconductors; aluminium compounds; field effect transistors; gallium arsenide; impurity scattering; semiconductor quantum wells; GaAs-AlGaAs:Si-AlGaAs; delta -doped double quantum wells; delta doping; electron wavefunctions; field-effect transistor; frequency-multiplier action; gate voltage; ionised impurity scattering; negative transconductance; resonant coupling; wavefunction modulation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930252
Filename :
274787
Link To Document :
بازگشت