DocumentCode
1044926
Title
Field distribution near the surface of beveled P-N junctions in high-voltage devices
Author
Cornu, Jozef
Author_Institution
Brown Boveri Research Center, Baden, Switzerland
Volume
20
Issue
4
fYear
1973
fDate
4/1/1973 12:00:00 AM
Firstpage
347
Lastpage
352
Abstract
A new method for investigating the field distribution near the surface of p-n junctions is presented. The results show that for negatively beveled junctions, an absolute field maximum exists underneath the surface. This field maximum rather than the field on the surface determines the breakdown voltage of the device. The dependency of the maximum field on various device parameters as base resistivity, bevel angle, and steepness of the doping profile is analyzed. In addition, the influence of surface charges and dielectrics is investigated. Finally, the advantages of positive bevel angles with respect to negative ones are demonstrated. The theoretical results were verified by potential probing measurements on the surface of high-voltage devices.
Keywords
Circuits; Electric breakdown; Laboratories; Noise measurement; Optimized production technology; P-n junctions; Photoelectricity; Power supplies; Resistors; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1973.17654
Filename
1477311
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