• DocumentCode
    1044926
  • Title

    Field distribution near the surface of beveled P-N junctions in high-voltage devices

  • Author

    Cornu, Jozef

  • Author_Institution
    Brown Boveri Research Center, Baden, Switzerland
  • Volume
    20
  • Issue
    4
  • fYear
    1973
  • fDate
    4/1/1973 12:00:00 AM
  • Firstpage
    347
  • Lastpage
    352
  • Abstract
    A new method for investigating the field distribution near the surface of p-n junctions is presented. The results show that for negatively beveled junctions, an absolute field maximum exists underneath the surface. This field maximum rather than the field on the surface determines the breakdown voltage of the device. The dependency of the maximum field on various device parameters as base resistivity, bevel angle, and steepness of the doping profile is analyzed. In addition, the influence of surface charges and dielectrics is investigated. Finally, the advantages of positive bevel angles with respect to negative ones are demonstrated. The theoretical results were verified by potential probing measurements on the surface of high-voltage devices.
  • Keywords
    Circuits; Electric breakdown; Laboratories; Noise measurement; Optimized production technology; P-n junctions; Photoelectricity; Power supplies; Resistors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1973.17654
  • Filename
    1477311