Title :
0.25 x 106 bit/in2 nondestructive readout coupled-film memory elements [Digests]
Author :
Chang, H. ; Mazzeo, N. ; Romankiw, L.
Author_Institution :
Thomas J. Watson Research Center, IBM Corporation, Yorktown Heights, N.Y.
fDate :
9/1/1970 12:00:00 AM
Abstract :
The storage density of coupled film memory elements has been increased from 104 bit/in2 to 0.25 X 106 bit/in2. The size and the density of a chip containing 4250 bits with a penny as background are illustrated, and the enlarged view of the same chip is shown. The high density is made possible by improving flux closures in both the easy and hard directions through the use of thin conductors, thin insulations, and Permalloy keepers. The device storage stability is enhanced to permit NDRO operation through the use of multiple-pulse write and/or hard-direction bias fields. Typical performance parameters are IW = 60 mA, IB = 20 mA, and Vs = 150 μV.
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1970.1066958