DocumentCode
1045465
Title
Depletion layer amplification from negative differential mobility elements
Author
Grubin, H.L. ; Kaul, R.
Author_Institution
United Aircraft Research Laboratories, East Hartford, Conn.
Volume
20
Issue
6
fYear
1973
fDate
6/1/1973 12:00:00 AM
Firstpage
600
Lastpage
602
Abstract
Recent n-GaAs experiments and computer simulations have demonstrated that amplification from "supercritical" negative differential mobility (NDM) semiconductors is dependent on the shape of the dc stable electric field versus distance profile. For a specific nonuniform field profile, where a partially depleted charge layer is adjacent to the cathode, we show that small-signal amplification from 10-µ-long 1015/cm3NDM elements is 1) dependent upon conditions at the cathode boundary, 2) dc bias dependent, 3) arises from a subcritical region of the element, and 4) has a frequency band for small-signal negative resistance that is determined by the transit time of the carriers across the depleted region.
Keywords
Cathodes; Electron beams; Equations; Ion beams; Microelectronics; Microwave devices; Scanning electron microscopy; Semiconductor device doping; Solids; Switches;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1973.17706
Filename
1477363
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