• DocumentCode
    1045465
  • Title

    Depletion layer amplification from negative differential mobility elements

  • Author

    Grubin, H.L. ; Kaul, R.

  • Author_Institution
    United Aircraft Research Laboratories, East Hartford, Conn.
  • Volume
    20
  • Issue
    6
  • fYear
    1973
  • fDate
    6/1/1973 12:00:00 AM
  • Firstpage
    600
  • Lastpage
    602
  • Abstract
    Recent n-GaAs experiments and computer simulations have demonstrated that amplification from "supercritical" negative differential mobility (NDM) semiconductors is dependent on the shape of the dc stable electric field versus distance profile. For a specific nonuniform field profile, where a partially depleted charge layer is adjacent to the cathode, we show that small-signal amplification from 10-µ-long 1015/cm3NDM elements is 1) dependent upon conditions at the cathode boundary, 2) dc bias dependent, 3) arises from a subcritical region of the element, and 4) has a frequency band for small-signal negative resistance that is determined by the transit time of the carriers across the depleted region.
  • Keywords
    Cathodes; Electron beams; Equations; Ion beams; Microelectronics; Microwave devices; Scanning electron microscopy; Semiconductor device doping; Solids; Switches;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1973.17706
  • Filename
    1477363