DocumentCode
1045656
Title
Electron and Ion Tracks in Silicon: Spatial and Temporal Evolution
Author
Murat, Michael ; Akkerman, Avraham ; Barak, Joseph
Author_Institution
Soreq NRC, Yavne
Volume
55
Issue
6
fYear
2008
Firstpage
3046
Lastpage
3054
Abstract
Calculations based on our Monte Carlo code for the transport of electrons and ions in silicon are presented. The code follows the trajectories of all secondary electrons down to a very low cut-off energy (1.5 eV). The spatial and temporal distributions of the deposited energy around ion tracks in silicon are also calculated. The prompt electrical fields generated by the charges at the early stage of the track evolution are evaluated, taking into account carrier recombination. Using the statistics of the energy deposition events in small sensitive volumes, we find that the SEE cross sections in modern devices depend on the ion energy, in addition to its LET.
Keywords
CMOS integrated circuits; SRAM chips; electric fields; elemental semiconductors; silicon; CMOS SRAMs; Monte Carlo code; Si; carrier recombination; electrical fields; electron transport; energy deposition event; ion tracks; spatial distribution; statistic deposition event; temporal distributions; very low cut-off energy; Electrons; Measurement standards; Monte Carlo methods; Particle scattering; Production; Silicon; Single event upset; Spontaneous emission; Statistical distributions; Statistics; Charge radial distribution; Monte-Carlo simulation; multiple bit upset (MBU); straggling effects; time evolution of track structure;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2008.2007646
Filename
4723756
Link To Document