• DocumentCode
    1045656
  • Title

    Electron and Ion Tracks in Silicon: Spatial and Temporal Evolution

  • Author

    Murat, Michael ; Akkerman, Avraham ; Barak, Joseph

  • Author_Institution
    Soreq NRC, Yavne
  • Volume
    55
  • Issue
    6
  • fYear
    2008
  • Firstpage
    3046
  • Lastpage
    3054
  • Abstract
    Calculations based on our Monte Carlo code for the transport of electrons and ions in silicon are presented. The code follows the trajectories of all secondary electrons down to a very low cut-off energy (1.5 eV). The spatial and temporal distributions of the deposited energy around ion tracks in silicon are also calculated. The prompt electrical fields generated by the charges at the early stage of the track evolution are evaluated, taking into account carrier recombination. Using the statistics of the energy deposition events in small sensitive volumes, we find that the SEE cross sections in modern devices depend on the ion energy, in addition to its LET.
  • Keywords
    CMOS integrated circuits; SRAM chips; electric fields; elemental semiconductors; silicon; CMOS SRAMs; Monte Carlo code; Si; carrier recombination; electrical fields; electron transport; energy deposition event; ion tracks; spatial distribution; statistic deposition event; temporal distributions; very low cut-off energy; Electrons; Measurement standards; Monte Carlo methods; Particle scattering; Production; Silicon; Single event upset; Spontaneous emission; Statistical distributions; Statistics; Charge radial distribution; Monte-Carlo simulation; multiple bit upset (MBU); straggling effects; time evolution of track structure;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2008.2007646
  • Filename
    4723756