DocumentCode :
1045656
Title :
Electron and Ion Tracks in Silicon: Spatial and Temporal Evolution
Author :
Murat, Michael ; Akkerman, Avraham ; Barak, Joseph
Author_Institution :
Soreq NRC, Yavne
Volume :
55
Issue :
6
fYear :
2008
Firstpage :
3046
Lastpage :
3054
Abstract :
Calculations based on our Monte Carlo code for the transport of electrons and ions in silicon are presented. The code follows the trajectories of all secondary electrons down to a very low cut-off energy (1.5 eV). The spatial and temporal distributions of the deposited energy around ion tracks in silicon are also calculated. The prompt electrical fields generated by the charges at the early stage of the track evolution are evaluated, taking into account carrier recombination. Using the statistics of the energy deposition events in small sensitive volumes, we find that the SEE cross sections in modern devices depend on the ion energy, in addition to its LET.
Keywords :
CMOS integrated circuits; SRAM chips; electric fields; elemental semiconductors; silicon; CMOS SRAMs; Monte Carlo code; Si; carrier recombination; electrical fields; electron transport; energy deposition event; ion tracks; spatial distribution; statistic deposition event; temporal distributions; very low cut-off energy; Electrons; Measurement standards; Monte Carlo methods; Particle scattering; Production; Silicon; Single event upset; Spontaneous emission; Statistical distributions; Statistics; Charge radial distribution; Monte-Carlo simulation; multiple bit upset (MBU); straggling effects; time evolution of track structure;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2008.2007646
Filename :
4723756
Link To Document :
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