• DocumentCode
    104576
  • Title

    High-Performance Transparent AZO TFTs Fabricated on Glass Substrate

  • Author

    Jian Cai ; Dedong Han ; Youfeng Geng ; Wei Wang ; Liangliang Wang ; Shengdong Zhang ; Yi Wang

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • Volume
    60
  • Issue
    7
  • fYear
    2013
  • fDate
    Jul-13
  • Firstpage
    2432
  • Lastpage
    2435
  • Abstract
    High-performance transparent low-temperature top-gate type aluminum doped zinc oxide (AZO) thin-film transistors (TFTs) (W/L=100 or 10 μm) are successfully fabricated on glass substrate. All the process temperature is below 100°C. For VG=-2 to 5 V, the TFTs using sputtering deposit AZO layer at room temperature as channel layer exhibits excellent properties, such as a saturation mobility μs of 285 cm2/V·s, a linear field effect mobility μl of 143 cm2/V·s, a threshold voltage Vth of 0.9 V, a steep subthreshold swing of 108 mV/decade, a low off-state current value Ioff of 5×10-13 A, a high ON/OFF ratio of 2×109 and a high transmittance of 82.5%. The results highlight that excellent device performance can be realized in AZO TFTs. Note that this is the best performance of AZO TFT ever reported.
  • Keywords
    sputter deposition; substrates; thin film transistors; channel layer; glass substrate; high performance transparent AZO TFT; linear field effect mobility; low off state current value; process temperature; room temperature; saturation mobility; sputtering deposit AZO layer; subthreshold swing; thin film transistors; threshold voltage; transparent low temperature top gate type aluminum doped zinc oxide; voltage -2 V to 5 V; Aluminum doped zinc oxide (AZO); high performance; low temperature process; thin-film transistor (TFT);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2264319
  • Filename
    6531652