• DocumentCode
    1045858
  • Title

    Double-drift IMPATT diodes near 100 GHz

  • Author

    Niehaus, William C. ; Seidel, Thomas E. ; Iglesias, David E.

  • Author_Institution
    Bell Laboratories, Murray Hill, N. J.
  • Volume
    20
  • Issue
    9
  • fYear
    1973
  • fDate
    9/1/1973 12:00:00 AM
  • Firstpage
    765
  • Lastpage
    771
  • Abstract
    This paper reports the highest x power (frequency)2IMPATTS produced to date. A CW output power of 380 mW has been achieved at 92 GHz with an efficiency of 12.5 percent. An all-implanted double-drift n+-n-p-p+silicon structure was fabricated, using a lightly doped epitaxial layer as the starting material. The newly made structure uses a more shallow n+contact than previous diodes, and therefore has more equal drift spaces. Small-signal admittance calculations show lower susceptance per unit area in the newly made structure. The shallow contact has allowed the study of unequal dopings in the n- and p-drift spaces. Unequal dopings up to 50 percent can be tolerated with less than 20 percent variation in measured efficiency and output power. Both admittance and breakdown voltage calculations based upon experimentally determined doping profiles and independently measured ionization coefficients were found to be in good agreement with experiment. The doping profiles on both sides of the depletion region were determined by C(V) analysis. The testing of both the old and new structures has been carried out in a microwave circuit having improved mechanical tuning accuracy due to the introduction of a newly designed tuning plunger.
  • Keywords
    Admittance; Circuit optimization; Circuit testing; Diodes; Doping profiles; Epitaxial layers; Frequency; Power generation; Power measurement; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1973.17744
  • Filename
    1477401