DocumentCode
1045858
Title
Double-drift IMPATT diodes near 100 GHz
Author
Niehaus, William C. ; Seidel, Thomas E. ; Iglesias, David E.
Author_Institution
Bell Laboratories, Murray Hill, N. J.
Volume
20
Issue
9
fYear
1973
fDate
9/1/1973 12:00:00 AM
Firstpage
765
Lastpage
771
Abstract
This paper reports the highest
power (frequency)2IMPATTS produced to date. A CW output power of 380 mW has been achieved at 92 GHz with an efficiency of 12.5 percent. An all-implanted double-drift n+-n-p-p+silicon structure was fabricated, using a lightly doped epitaxial layer as the starting material. The newly made structure uses a more shallow n+contact than previous diodes, and therefore has more equal drift spaces. Small-signal admittance calculations show lower susceptance per unit area in the newly made structure. The shallow contact has allowed the study of unequal dopings in the n- and p-drift spaces. Unequal dopings up to 50 percent can be tolerated with less than 20 percent variation in measured efficiency and output power. Both admittance and breakdown voltage calculations based upon experimentally determined doping profiles and independently measured ionization coefficients were found to be in good agreement with experiment. The doping profiles on both sides of the depletion region were determined by
analysis. The testing of both the old and new structures has been carried out in a microwave circuit having improved mechanical tuning accuracy due to the introduction of a newly designed tuning plunger.
power (frequency)2IMPATTS produced to date. A CW output power of 380 mW has been achieved at 92 GHz with an efficiency of 12.5 percent. An all-implanted double-drift n+-n-p-p+silicon structure was fabricated, using a lightly doped epitaxial layer as the starting material. The newly made structure uses a more shallow n+contact than previous diodes, and therefore has more equal drift spaces. Small-signal admittance calculations show lower susceptance per unit area in the newly made structure. The shallow contact has allowed the study of unequal dopings in the n- and p-drift spaces. Unequal dopings up to 50 percent can be tolerated with less than 20 percent variation in measured efficiency and output power. Both admittance and breakdown voltage calculations based upon experimentally determined doping profiles and independently measured ionization coefficients were found to be in good agreement with experiment. The doping profiles on both sides of the depletion region were determined by
analysis. The testing of both the old and new structures has been carried out in a microwave circuit having improved mechanical tuning accuracy due to the introduction of a newly designed tuning plunger.Keywords
Admittance; Circuit optimization; Circuit testing; Diodes; Doping profiles; Epitaxial layers; Frequency; Power generation; Power measurement; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1973.17744
Filename
1477401
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