DocumentCode :
1045948
Title :
Study of Latent Damage in Power MOSFETs Caused by Heavy Ion Irradiation
Author :
Ikeda, Naomi ; Kuboyama, Satoshi ; Satoh, Yohei ; Tamura, Takashi
Author_Institution :
Japan Aerosp. Exploration Agency, Tsukuba
Volume :
55
Issue :
6
fYear :
2008
Firstpage :
3388
Lastpage :
3393
Abstract :
The latent damages were investigated for power MOSFETs irradiated by high LET heavy ions. It was demonstrated that the post irradiation leakage current in damaged gate oxide was determined by the initial gate stress after the irradiation and the damage was stable even after a million of gate stress repetition.
Keywords :
leakage currents; power MOSFET; radiation effects; damaged gate oxide; heavy ion irradiation; high LET heavy ions; initial gate stress; latent damage; post irradiation leakage current; power MOSFET; Dielectric breakdown; Electric breakdown; Epitaxial layers; Leakage current; MOSFETs; Neck; Prototypes; Stress; Synchrotrons; Voltage; Heavy ion; latent damage; power MOSFET;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2008.2007902
Filename :
4723784
Link To Document :
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