Title :
A promising lithography gets stuck
Abstract :
Once aimed at the mainstream, electron projection lithography will have a diminished role-if any.
Keywords :
electron beam lithography; direct-write system; electron projection lithography; next-generation lithography; reflective optics; semiconductor industry; throughput; Electrons; Gallium arsenide; Gallium nitride; III-V semiconductor materials; Lithography; Manufacturing; Optical refraction; Substrates; Throughput; Ultraviolet sources;
Journal_Title :
Spectrum, IEEE
DOI :
10.1109/MSPEC.2004.1317881
