• DocumentCode
    1045985
  • Title

    A promising lithography gets stuck

  • Author

    Geppert, Linda

  • Volume
    41
  • Issue
    1
  • fYear
    2004
  • Firstpage
    56
  • Lastpage
    57
  • Abstract
    Once aimed at the mainstream, electron projection lithography will have a diminished role-if any.
  • Keywords
    electron beam lithography; direct-write system; electron projection lithography; next-generation lithography; reflective optics; semiconductor industry; throughput; Electrons; Gallium arsenide; Gallium nitride; III-V semiconductor materials; Lithography; Manufacturing; Optical refraction; Substrates; Throughput; Ultraviolet sources;
  • fLanguage
    English
  • Journal_Title
    Spectrum, IEEE
  • Publisher
    ieee
  • ISSN
    0018-9235
  • Type

    jour

  • DOI
    10.1109/MSPEC.2004.1317881
  • Filename
    1317881
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1045985