DocumentCode :
1046237
Title :
Temperature dependence of IDDQ distribution: application for thermal delta IDDQ testing
Author :
Kaltchenko, A. ; Semenov, O.
Author_Institution :
Dept. of Phys. & Comput., Wilfrid Laurier Univ., Waterloo, ON
Volume :
1
Issue :
6
fYear :
2007
fDate :
12/1/2007 12:00:00 AM
Firstpage :
509
Lastpage :
516
Abstract :
The increase in process parameter variations and off-state current for deep submicron complementary metal oxide semiconductor (CMOS) technologies makes conventional (single threshold) IDDQ testing ineffective. Delta IDDQ testing performed at two temperatures for a given test vector and called ´thermal delta IDDQ testing´ is a more attractive alternative and is investigated by the authors. On the basis of statistical Monte Carlo simulations and industrial data, it is shown that lowering the temperature from 330 K to 280 K results in a more than times100 reduction of Iddq mean value and approximately times15 reduction of Iddq standard deviation of defect-free 0.18 m CMOS circuits.
Keywords :
CMOS integrated circuits; Monte Carlo methods; integrated circuit testing; statistical analysis; CMOS technology; complementary metal oxide semiconductor; statistical Monte Carlo simulation; temperature 280 K to 330 K; thermal delta IDDQ testing;
fLanguage :
English
Journal_Title :
Circuits, Devices & Systems, IET
Publisher :
iet
ISSN :
1751-858X
Type :
jour
DOI :
10.1049/iet-cds:20070074
Filename :
4437869
Link To Document :
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