• DocumentCode
    1046237
  • Title

    Temperature dependence of IDDQ distribution: application for thermal delta IDDQ testing

  • Author

    Kaltchenko, A. ; Semenov, O.

  • Author_Institution
    Dept. of Phys. & Comput., Wilfrid Laurier Univ., Waterloo, ON
  • Volume
    1
  • Issue
    6
  • fYear
    2007
  • fDate
    12/1/2007 12:00:00 AM
  • Firstpage
    509
  • Lastpage
    516
  • Abstract
    The increase in process parameter variations and off-state current for deep submicron complementary metal oxide semiconductor (CMOS) technologies makes conventional (single threshold) IDDQ testing ineffective. Delta IDDQ testing performed at two temperatures for a given test vector and called ´thermal delta IDDQ testing´ is a more attractive alternative and is investigated by the authors. On the basis of statistical Monte Carlo simulations and industrial data, it is shown that lowering the temperature from 330 K to 280 K results in a more than times100 reduction of Iddq mean value and approximately times15 reduction of Iddq standard deviation of defect-free 0.18 m CMOS circuits.
  • Keywords
    CMOS integrated circuits; Monte Carlo methods; integrated circuit testing; statistical analysis; CMOS technology; complementary metal oxide semiconductor; statistical Monte Carlo simulation; temperature 280 K to 330 K; thermal delta IDDQ testing;
  • fLanguage
    English
  • Journal_Title
    Circuits, Devices & Systems, IET
  • Publisher
    iet
  • ISSN
    1751-858X
  • Type

    jour

  • DOI
    10.1049/iet-cds:20070074
  • Filename
    4437869