DocumentCode :
1046351
Title :
Probe card with probe pins grown by the vapor-liquid-solid (VLS) method
Author :
Asai, Shin Ichiro ; Kato, Kazuo ; Nakazaki, Noriaki ; Nakajima, Yuluhiko
Author_Institution :
Res. Center, Denki Kagaku Kogyo K.K., Tokyo, Japan
Volume :
19
Issue :
2
fYear :
1996
fDate :
6/1/1996 12:00:00 AM
Firstpage :
258
Lastpage :
267
Abstract :
Probe cards mounted with vapor-liquid-solid (VLS) grown silicon whiskers have been produced. In this development the “mesa method”, in which VLS whiskers are grown on silicon mesas topped with gold hats, has been successfully introduced which allows accurate positioning of the VLS whiskers. The VLS whisker grows vertically to over 2000 μm in length and a diameter of 10-100 μm has been obtained. The metal-plated whisker has enough compliance with the overdrive capability of up to 400 μm to compensate for the prober error and the possible irregularity of the wafer surface which maintains reliable contact. Two fabrication methods to accomplish the wiring of the VLS whiskers onto the card assembly are proposed. One method is to transfer the VLS whiskers onto a patterned substrate after encapsulating in a transfer media, the other is to grow the VLS whiskers on a patterned silicon-on-insulator (SOI) wafer. The design concept of the whisker probe pins is also proposed. The card has the potential to be used as a narrow-pitch, high pad-count probe card which has more than 300 probe pins which are less than 50 μm in pitch. The card obtained by the SOI process has potential application as a wafer level burn-in (WLBI) card with the same thermal expansion coefficient as a silicon wafer. Patterning on a SOI wafer enables a possible low-impedance transmission line in a high speed circuit
Keywords :
VLSI; crystal growth from solution; crystal growth from vapour; elemental semiconductors; integrated circuit reliability; multichip modules; probes; silicon; thermal expansion; whiskers (crystal); 10 to 100 micron; 2000 micron; KGD; MCMs; SOI wafer; Si; VLSI; low-impedance transmission line; mesa method; metal-plated whisker; overdrive capability; patterned substrate; probe card; probe pins; thermal expansion coefficient; vapor-liquid-solid method; wafer level burn-in; wafer surface; wiring; Assembly; Distributed parameter circuits; Fabrication; Gold; Maintenance; Pins; Probes; Silicon on insulator technology; Thermal expansion; Wiring;
fLanguage :
English
Journal_Title :
Components, Packaging, and Manufacturing Technology, Part A, IEEE Transactions on
Publisher :
ieee
ISSN :
1070-9886
Type :
jour
DOI :
10.1109/95.506112
Filename :
506112
Link To Document :
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