DocumentCode
1046913
Title
The importance of mask alignment on the orientation dependent etching of silicon and applications
Author
Kendall, Don L.
Volume
20
Issue
12
fYear
1973
fDate
12/1/1973 12:00:00 AM
Firstpage
1177
Lastpage
1177
Keywords
Charge carrier processes; Current measurement; Etching; Magnetic fields; Magnetic switching; Plasma measurements; Silicon; Superconductivity; Switches; Time measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1973.17844
Filename
1477501
Link To Document