• DocumentCode
    1046952
  • Title

    A General and Reliable Model for Charge Pumping—Part II: Application to the Study of Traps in \\hbox {SiO}_{2} or in High- $hbox{Si}{-}hbox{SiO}_{2}$ interface; Charge pumping (CP); MOSFETs; high-$kappa$ gate stacks; model; oxide traps; trap profiles;

  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2009024
  • Filename
    4723906